Tetramethylammonium Hydroxide (TMAH) is a high-purity, aqueous quaternary ammonium compound that serves as an essential developer and etchant in today’s advanced electronics manufacturing. TMAH is widely used across photolithography, wafer cleaning, and MEMS fabrication due to its outstanding selectivity, process precision, and ultra-low trace metal content.
GRADE AVAILABLE
25% Aqueous 2.38%–5.5% Developer Solutions
and customized concentrations to suit process needs
SUSTAINABILITY
In partnership with leading manufacturers, we support TMAH recycling and circular economy programs, allowing recovery and re-purification ofprocess chemicals for reduced environmental impact and compliance with globalsustainability goals.
APPLICATIONS
Photoresist development in integrated circuit production, siliconanisotropic wet etching, cleaning for display panels, and solar cell manufacturing
PRODUCT
IPA
Isopropyl Alcohol (IPA) is an ultra-high purity solvent and cleaning agent, fundamental tosemiconductor fabrication, LCD display production, and precision cleaning applications.Our electronic-grade IPA is produced using advanced purification and quality controlsystems to meet the stringent demands of global chip and electronics manufacturers.
PURITY LEVELS
99.99% up to 99.9999%
(electronic grade), with industry-bestcontrols of trace metals (<0.1 ppb), water content, and particulates
QUALITY FEATURES
Ultra-low metallic and non-metallic contaminants (down to subppb), low total organic carbon (TOC), and minimized particle count to ensureprocess reliability and protect advanced node yields
APPLICATIONS
Wafer surface cleaning, photoresist stripping, post-etch and postash cleaning, and tool/fixture cleaning in cleanroom environments
